Photochemical compound semiconductor plasma processing equipment
Years of experience and accumulated processing know-how! Over 1,300 units delivered for compound semiconductor processing.
The "plasma processing equipment" is a plasma etching and deposition device for optical compound semiconductors. It is capable of providing systems suitable for various stages from research and development to mass production. Additionally, it is designed to handle a wide range of materials necessary for the manufacturing of optoelectronic devices. Please feel free to contact us when needed. 【Applications】 VCSEL, LED, μLED, Micro Lens, Wave Guide 【Etching】 Sapphire, GaN, GaAs, Si3N4, SiO2, etc. 【Deposition】 nSiO2, Si3N4, a-Si, SiC, etc. *You can download the English version of the catalog. *For more details, please refer to the PDF materials or feel free to contact us.
- Company：プラズマ・サーモ・ジャパン
- Price：Other
